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Low-temperature atomic layer deposition delivers more active and stable Pt-based catalysts

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dc.contributor.authorHao Van Bui
dc.contributor.authorFabio Grillo
dc.contributor.authorSri Sharath Kulkarni
dc.contributor.authorRonald Bevaart
dc.contributor.authorNguyen Van Thang
dc.contributor.authorBart van der Linden
dc.contributor.authorJacob A. Moulijn
dc.contributor.authorMichiel Makkee
dc.contributor.authorMichiel T. Kreutzera
dc.contributor.authorand J. Ruud van Ommen
dc.date.accessioned2026-05-24T16:43:36Z
dc.date.available2026-05-24T16:43:36Z
dc.date.issued2017-01-01
dc.description.abstractLow-temperature atomic layer deposition delivers more active and stable Pt-based catalysts
dc.identifier.doihttps://doi.org/10.1039/C7NR02984E
dc.identifier.isbn20403364
dc.identifier.urihttps://rims.qnu.edu.vn/handle/123456789/1441
dc.subjectAtomic layer deposition
dc.subjectPt-based catalysts
dc.subjectStable
dc.titleLow-temperature atomic layer deposition delivers more active and stable Pt-based catalysts
dc.typejournal article
dspace.entity.typePublication
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon

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