Publication:
Inductively-Coupled Plasma Chemical Vapor Growth Characteristics of Graphene Depending on Various Metal Substrates

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dc.contributor.authorDong-Ok Kim
dc.contributor.authorTran Nam Trung
dc.contributor.authorand Eui-Tae Kim
dc.date.accessioned2026-05-24T16:42:34Z
dc.date.available2026-05-24T16:42:34Z
dc.date.issued2014-01-01
dc.description.abstractInductively-Coupled Plasma Chemical Vapor Growth Characteristics of Graphene Depending on Various Metal Substrates
dc.identifier.doi10.3740/MRSK.2014.24.12.694
dc.identifier.isbn1225-0562
dc.identifier.urihttps://rims.qnu.edu.vn/handle/123456789/1220
dc.subjectICP-CVD
dc.subjectGraphene
dc.subjectMetal Substrates
dc.titleInductively-Coupled Plasma Chemical Vapor Growth Characteristics of Graphene Depending on Various Metal Substrates
dc.typejournal article
dspace.entity.typePublication
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon

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