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Understanding the Growth Kinetics of Graphene on Cu and Fe2O3 Using Inductively-Coupled Plasma Chemical Vapor Deposition

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dc.contributor.authorLam Van Nang
dc.contributor.authorDong-Ok Kim
dc.contributor.authorTran Nam Trung
dc.contributor.authorVinaya Kumar Arepalli
dc.contributor.authorand Eui-Tae Kim
dc.date.accessioned2026-05-24T16:42:34Z
dc.date.available2026-05-24T16:42:34Z
dc.date.issued2017-01-01
dc.description.abstractUnderstanding the Growth Kinetics of Graphene on Cu and Fe2O3 Using Inductively-Coupled Plasma Chemical Vapor Deposition
dc.identifier.doihttps://doi.org/10.9729/AM.2017.47.1.13
dc.identifier.isbn2287-4445
dc.identifier.urihttps://rims.qnu.edu.vn/handle/123456789/1218
dc.subjectGraphene
dc.subjectGrowth Kinetics
dc.subjectICP-CVD
dc.titleUnderstanding the Growth Kinetics of Graphene on Cu and Fe2O3 Using Inductively-Coupled Plasma Chemical Vapor Deposition
dc.typejournal article
dspace.entity.typePublication
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon

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