Publication:
Formation of SiO2/Si system morphology under the action of excimer laser radiation

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dc.contributor.authorHuynh Cong Tu
dc.contributor.authorA. M. Skvortsov
dc.contributor.authorA. A. Petrov
dc.date.accessioned2026-05-24T16:48:12Z
dc.date.available2026-05-24T16:48:12Z
dc.date.issued2014-01-01
dc.description.abstractFormation of SiO2/Si system morphology under the action of excimer laser radiation
dc.identifier.doi10.17586/0021-3454
dc.identifier.isbnISSN 0021-3454
dc.identifier.urihttps://rims.qnu.edu.vn/handle/123456789/4305
dc.subjectMorphology formation
dc.subjectExcimer laser
dc.subjectSiO2/Si system
dc.titleFormation of SiO2/Si system morphology under the action of excimer laser radiation
dc.typejournal article
dspace.entity.typePublication
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon

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