Publication:
The influence of ArF excimer laser irradiation on electrical properties of Si/SiO2 structure

dc.contributor.authorHuynh Cong Tu
dc.contributor.authorHo Van Phi
dc.date.accessioned2026-05-24T16:48:11Z
dc.date.available2026-05-24T16:48:11Z
dc.date.issued2017-01-01
dc.description.abstractThe influence of ArF excimer laser irradiation on electrical properties of Si/SiO2 structure
dc.identifier.doihttps://doi.org/10.52111/qnjs
dc.identifier.isbnISSN: 1859-0357
dc.identifier.urihttps://rims.qnu.edu.vn/handle/123456789/4285
dc.subjectArF excimer laser
dc.subjectSi/SiO2 structure
dc.subjectElectrical properties
dc.titleThe influence of ArF excimer laser irradiation on electrical properties of Si/SiO2 structure
dc.typejournal article
dspace.entity.typePublication
oairecerif.author.affiliationTruong Dai hoc Quy Nhon
oairecerif.author.affiliationTruong Dai hoc Quy Nhon

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